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Search for "in situ resistometry" in Full Text gives 1 result(s) in Beilstein Journal of Nanotechnology.

Adsorption and desorption of self-assembled L-cysteine monolayers on nanoporous gold monitored by in situ resistometry

  • Elisabeth Hengge,
  • Eva-Maria Steyskal,
  • Rupert Bachler,
  • Alexander Dennig,
  • Bernd Nidetzky and
  • Roland Würschum

Beilstein J. Nanotechnol. 2019, 10, 2275–2279, doi:10.3762/bjnano.10.219

Graphical Abstract
  • resistometry. From the desorption peak related to the (111) surface of the structure, which is associated with a resistance change of 4.8%, an initial surface coverage of 0.48 monolayers of cysteine could be estimated. Keywords: L-cysteine; in situ resistometry; nanoporous gold; self-assembled monolayer (SAM
  • -/desorption of SAMs on nanoporous gold (npAu), based on our experience on in situ resistometry as a highly sensitive diagnosis tool for ad-/desorption processes [9]. The selected SAM material for this study is cysteine, due to its beneficial properties such as the short carbon backbone, the solubility in
  • be suitable for sensitively detecting even small amounts of SAMs on npAu. In conclusion, in situ resistometry proved to be a highly sensitive tool for dynamically monitoring the formation process of self-assembled monolayers, exemplarily using cysteine. The assembly takes place with a total
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Published 18 Nov 2019
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